1) Si2 uses Auth0 for user authentication. Recently, Auth0 implemented necessary heightened security for 1) leaked passwords and 2) brute-force login attempts.
IF YOU GET AN ERROR ON LOGIN ( Note: AT TOP of Login Form ) ---- AND SEE one of these POSSIBLE error messages:
Possible Error Message: password-leak. This error indicates that a password, used by the same user-name or user email-address, was leaked from a different site. IF you get this error!! You must change your Si2 password.
Possible Error Message: too_many_attemps. TEN consecutive, unsuccessful, login attemps will cause a block on an account.
IF you get this error!! YOU MUST CONTACT Si2 to UNBLOCK your account at Auth0.
2) NEW SIGNED LICENSE Will Be NEEDED: Si2 OpenAccess Extension Downloads, like oaScript and oaxPop, currently require the signed OpenAccess ESG License v 2.0 January 31, 2013. This license is being replaced SOON by the
OpenAccess ESG License V2.0.1 (March 15, 2017).
Your company should download, sign, and submit OpenAccess ESG License V2.0.1 (March 15, 2017). See See License Information Here!
Manufacturability Coalition (DFMC)
Design for Manufacturability design flows have become
increasingly critical as normal excursions in
semiconductor manufacturing result in significant
variations for yield, power and performance at 45 nm
process nodes and below. Both Process limited yield
(PLY) and Circuit limited yield (CLY). lower
manufacturing profits since these circuits must be
scrapped or sold at a discount because they miss the
power and/or performance targets of a nominal device.
In response to these issues, the
Design for Manufacturability Coalition (DFMC) has
developed a standard interface format that describes a
comprehensive set of
DFM parameters that can verify that a circuit will meet
it’s profit targets. The DFM parameters are defined in
an open-source and extensible standard format called
OpenDFM which provides a common set of DFM parameters to
a wide variety of physical verification and analysis
tools dramatically improving the interface between EDA
Plans for 2012 include: OpenDFM
2.x to include DRC+ and other enhancements, OPEX 1.0 to
open parasitic extraction parameters, and a new
standard, OpenLVS, to cover LVS.
Accomplishments - 2011
OpenDFM 1.1 Physical
Verification standard released, including ESD (Electro
Static Discharge) and Latch Up Checks, Edge Operations
and Edge Checks, and new Targeting
Functions that will improve manufacturability
and development of OPEX 1.0 specification to be
released as a standard in 2012
DRC+ contributed to
accelerate next-generation standard in DRC pattern