IC Design: PDKs and DFM Standards Working Together
June 6, 8:30AM – 12:30PM, Room 29AB
complexity of rules and processes needed to ensure the
manufacturability of ICs is increasing rapidly with every new
technology node. Many of the issues involving Process Design Kits
(PDK’s) and Design for Manufacturability (DFM) are interrelated and can
be simplified, if not eliminated, by standardized industry practices.
This workshop will highlight those interrelated standards and showcase
the ongoing work being done by industry leaders in solving these
are the fundamental building blocks for all electronic design.
Standardized representation of PDK content and interfaces will offer
operating efficiencies to foundries, EDA companies, IP providers and
design companies who use the PDK’s, create their own kits or need to
modify those that they receive from their foundries. Resultant PDK’s
are expected to be more robust and portable than ever before.
the DFM arena, standardization has proceeded along 2 parallel fronts.
In physical DFM, a standard high-level DFM verification and
optimization language called OpenDFM has been defined to support the
needs of manufacturability and PDK generation. OpenDFM rules bridge the
gap between a layout style that allows only a few, very restricted
layout patterns and a style that allows purely arbitrary layouts.
Second, there is ongoing effort to standardize a common format for
representing parasitic information and to better handle manufacturing
variability. This has implications in how this data is represented in
PDK’s and how they affect the modeling of design parameters for power,
timing and SI analysis.
Click on each title to view presentation
Industry Practices: How
PDKs and DFM Standards Can Work Together
09:10AM - 09:40PM:
OPDK Coalition Overview, Robert Hum, Mentor Graphics
09:40AM - 10:10AM:
Open Process Spec Progress: Gilles Namur, STMicroelectronics
10:10AM - 10:40AM:
Symbols, CDF, and Callback Progress: Rich Morse, Springsoft
11:00AM - 12:30PM OpenDFM Session
11:00AM - 11:30AM:
2011 OpenDFM Overview, A Customer Perspective, Fred Valente, TI
11:30AM - 12:00PM:
Targeting and Litho Bias, Bob Sayah, IBM
12:00PM - 12:30PM: Parasitic
Extraction Standards and Design for
Variability, Concetta Riccobene, LSI
Parasitic Exchange Demo